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Research outputs

As an application-oriented research organisation, Fraunhofer aims to conduct highly innovative and solution-oriented research - for the benefit of society and to strengthen the German and European economy.

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Projects

Fraunhofer is tackling the current challenges facing industry head on. By pooling their expertise and involving industrial partners at an early stage, the Fraunhofer Institutes involved in the projects aim to turn original scientific ideas into marketable products as quickly as possible.

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Researchers

Scientific achievement and practical relevance are not opposites - at Fraunhofer they are mutually dependent. Thanks to the close organisational links between Fraunhofer Institutes and universities, science at Fraunhofer is conducted at an internationally first-class level.

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Institutes

The Fraunhofer-Gesellschaft is the leading organisation for applied research in Europe. Institutes and research facilities work under its umbrella at various locations throughout Germany.

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  • Publication
    Bestimmung von in Holzschutzmitteln eingesetzten Wirkstoffen in festen und flüssigen Matrizes
    ( 2000)
    Gunschera, J.
    Infolge der Ausrüstung von Holz mit biozid wirksamen Mitteln zum Schutz vor holzzerstörenden oder -verfärbenden Pilzen und Insekten stellt sich spätestens nach Ablauf der Gebrauchsdauer, aber auch bereits während der Nutzung das Problem des potentiellen Freisetzung der Wirkstoffe in die Umwelt. Dies erfordert Kontrollmechanismen bezüglich des Gehaltes dieser Chemikalien im Holz, aber auch in den zum Schutz des Holzes eingesetzten Produkten. Eine wichtige Voraussetzung für diese Kontrollmechanismen ist das Vorhandensein von Analysenmethoden zur Bestimmung der Gehalte der verwendeten Wirkstoffe in allen relevanten Matrizes. Der Text befaßt sich mit den Besonderheiten der Analytik von Holzschutzmittelwirkstoffen in Holz und insbesondere in den Holzschutzmittelformulierungen.
  • Publication
    On the voltage scaling potential of SONOS non-volatile memory transistors
    ( 2015)
    Ocker, J.
    ;
    Slesazeck, S.
    ;
    Mikolajick, T.
    ;
    Buschbeck, S.
    ;
    Günther, S.
    ;
    Yurchuk, E.
    ;
    Hoffmann, R.
    ;
    Beyer, V.
    With technology scaling of embedded nonvolatile memories, voltage scaling below 12 V is a primary goal to maintain the area efficiency of the memory module. The SONOS technology shows promise as a technology for present and future low voltage memory cells. This paper examines the physics of scaled SONOS gate dielectrics in relation to reducing the operational voltage. In particular, we have examined the influence of tunnel oxide, nitride and top oxide thicknesses. The results are supported by electrical simulation of the SONOS gate dielectric. By properly scaling the dielectric films and utilizing electrical simulation we have determined a limit for scalability of the SONOS technology in terms of operation voltage.